Comment Period Extended Until July 30th: NIST Cybersecurity Framework 2.0 Profile for Semiconductor Manufacturing
The NIST National Cybersecurity Center of Excellence (NCCoE), along with the SEMI Semiconductor Manufacturing Cybersecurity Consortium, has published the draft of NIST Internal Report (NIST IR) 8546, Cybersecurity Framework (CSF) 2.0 Semiconductor Manufacturing Community Profile.
The public comment period for this draft has been extended until 11:59 p.m. EDT on July 30, 2025. All comments received by then will be reviewed and adjudicated to inform the final publication.
About the Draft
Draft NIST Internal Report (IR) 8546, Cybersecurity Framework 2.0 Semiconductor Manufacturing Community Profile, provides a voluntary, risk-based approach for managing cybersecurity activities and reducing cybersecurity risk to semiconductor manufacturing. The semiconductor manufacturing environment is a complex ecosystem of device makers, original equipment manufacturers, suppliers, and solution providers. This Profile focuses on desired cybersecurity outcomes and can be used as a guideline to improve the current cybersecurity posture of the semiconductor manufacturing ecosystem.
To stay informed about this work and receive project updates, join the NCCoE Semiconductor Manufacturing Community of Interest (COI).
NIST Cybersecurity and Privacy Program
Questions/Comments about this notice: semiconductor-manufacturing-profile@nist.gov
NCCoE Website questions: nccoe@nist.gov
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