Comment Period Extended Until May 30th & Workshop Recording Available: NIST Cybersecurity Framework 2.0 Profile for Semiconductor Manufacturing
The National Cybersecurity Center of Excellence (NCCoE), along with the SEMI Semiconductor Manufacturing Cybersecurity Consortium, has released for public comment the draft of NIST Internal Report (NIST IR) 8546, Cybersecurity Framework (CSF) 2.0 Semiconductor Manufacturing Community Profile.
The public comment period for this draft has been extended until 11:59 p.m. EDT on May 30, 2025. All comments received by then will be reviewed and adjudicated to inform the final publication.
About the Draft
Draft NIST Internal Report (IR) 8546, Cybersecurity Framework 2.0 Semiconductor Manufacturing Community Profile, provides a voluntary, risk-based approach for managing cybersecurity activities and reducing cybersecurity risk to semiconductor manufacturing. The semiconductor manufacturing environment is a complex ecosystem of device makers, original equipment manufacturers, suppliers, and solution providers. This Profile focuses on desired cybersecurity outcomes and can be used as a guideline to improve the current cybersecurity posture of the semiconductor manufacturing ecosystem.
Workshop Recording
Thank you to those who joined us for the Cybersecurity Framework Profile for Semiconductor Manufacturing Public Workshop on March 13, 2025. The recording of this event is now available on the NCCoE event page.
To stay informed about this work and receive project updates, join the NCCoE Semiconductor Manufacturing Community of Interest (COI).
Email us at semiconductor-manufacturing-profile@nist.gov.
Questions about SEMI and SMCC should be directed to cybersecurity@semi.org.
NIST Cybersecurity and Privacy Program
Questions/Comments about this notice: semiconductor-manufacturing-profile@nist.gov
NCCoE Website questions: nccoe@nist.gov
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